JI, Yanxu. Optimization of Lithography Process Parameters for Improving Photodetector Array Performance. Exploring Science Academic Conference Series, [S. l.], v. 20, p. 149–154, 2026. DOI: 10.70267/mseac.2026149154. Disponível em: https://journals.zeuspress.org/index.php/conference/article/view/1228. Acesso em: 24 aug. 2026.